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Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
Abstrakt
Optical, photo-electrochemical, crystallographic and morphological properties of TiO2 thin films prepared by high power impulse magnetron sputtering at low substrate temperatures (<65 ◦C) without post-deposition thermal annealing are studied. The film composition-anatase, rutile or amorphous TiO2-is adjusted by the pressure (p ∼ 0.75-15 Pa) in the deposition chamber. The different crystallographic phases were determined with grazing incidence x-ray diffractometry. The surface morphology and size of TiO2 grains/clusters were imaged with atomic force microscopy. Basic plasma parameters were determined by means of the time-resolved Langmuir probe technique. The power density influx on the substrate was estimated from calorimetric probe measurement. The data from calorimetric probe measurements and time-resolved Langmuir probe served as input parameters for the calculation of influx contributions of particular species. The band-gap energy Eg depends on the film composition and crystallographic phase. Optical parameters (refractive index n + ik, transmittance T , reflectance R and absorbance A) are measured as functions of photon energy in theUV-Vis range by spectroscopic ellipsometry. For the rutile and anatase films agreement with the respective bulk phase is found. Incident photon-current conversion efficiency determined by photo- electrochemical measurements reached the highest values (0.312) for the anatase film.
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Informacje szczegółowe
- Kategoria:
- Publikacja w czasopiśmie
- Typ:
- artykuł w czasopiśmie wyróżnionym w JCR
- Opublikowano w:
-
JOURNAL OF PHYSICS D-APPLIED PHYSICS
nr 42,
ISSN: 0022-3727 - Język:
- angielski
- Rok wydania:
- 2009
- Opis bibliograficzny:
- Straňák V., Čada M., Quaas M., Block S., Bogdanowicz R., Kment Š., Wulff H., Hippler R., Hubička Z., Tichý M.: Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure// JOURNAL OF PHYSICS D-APPLIED PHYSICS. -Vol. 42, (2009),
- Weryfikacja:
- Politechnika Gdańska
wyświetlono 71 razy
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