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Chemical investigation of the Al2O3 ultra-thin films
Dane BadawczeUltra-thin layers of oluminum oxide (Al2O3) were deposited by ALD method. Atomic layer deposition provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. Samples with a thickness of 2 and 8 nm of alumina...
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Depth profile of the composition of 8 nm Al2O3 thin film
Dane Badawcze8 nm layer of aluminum oxide (Al2O3) was deposited by ALD method on a s. Atomic layer deposition provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. To investigate the profile of concenration of...
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Surface modifcation of PMMA polymer detected by XPS
Dane BadawczeIn order to obtain the experimental specimens, four PMMA/PC61BM samples with the following mass proportions were prepared: 10%, 20%, 30%, and 40%. In addition, as a reference, a PMMA sample without PC61BM was prepared as well. For the fabrication process, PC61BM 99.5% (Solenne BV), chloroform HPLC (Sigma Aldrich), and PMMA (commercially available...