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Wyniki wyszukiwania dla: NOVEL TRENDS IN SAMPLE PREPARATION
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Temperture-programmed reduction (H2-TPR) of Ni-Mo2CTx_Mo2Ga2C and Ni-Mo2CTx_Mo3AlC2 catalysts
Dane BadawczeThe dataset includes the data for the preparation of plots illustrating the reduction peaks versus the temperature of the catalyst sample.
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Validation of result of STM probe fabrication
Dane BadawczeThe scanning tunneling microscope [1] is a powerful research tool that allows, among other things, to obtain images with atomic resolution. A serious limitation of the described microscope is its limited applicability relating to conductive and semiconductor materials and the reproducibility of measurements depending on the preparation of the measuring...
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Nanostructures fabrication with use of electrical AFM litography
Dane BadawczeIn the last 10 years, one of the nanotechnological trends has been observed, consisting in the development of new variants of computer memory systems with high capacity and speed of access, using quantum dots. One of the techniques for creating nanodots and other nanostructures is based on the use of an atomic force microscope acting as a lithographic...
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Data from the survey on Gdańsk University of Technology graduates’ competencies assessment by entrepreneurs
Dane BadawczeThe dataset includes data from the survey on the Gdańsk University of Technology (GUT) graduates’ competencies assessment by entrepreneurs. The survey was conducted in 2017. The research sample included 102 respondents representing various firms from Pomeranian Voivodship. The study concerned i.a. assessment of GUT graduates' preparation for the requirements...
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SEM micrographs of VO2 and V6O13 nanostructures
Dane BadawczeThe DataSet contains the scanning electron microscopy (SEM) micrographs of VO2 and V6O13 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under a reducing atmosphere (94% Ar, 6% H2) at 600 and 700C for 10h.
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XRD patterns of the V2O5 coatings after thermal treatment under reducing atmosphere
Dane BadawczeThe DataSet contains the XRD patterns of V2O5 coatings on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 500C, 600C, and 700C for 10 under a reducing atmosphere (94% Ar, 6% H2).
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SEM micrographs of the V2O5 coatings after thermal treatment under reducing atmosphere
Dane BadawczeThe DataSet contains the scanning electron microscopy (SEM) micrographs of V2O5 coatings on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 600C and 700C for 10 under a reducing atmosphere (94% Ar, 6% H2).
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Morphology and structure of V2O5 nanorods deposited on the silicon substrate after reduction
Dane BadawczeThe DataSet contains the XRD patterns and SEM micrographs of V2O5 nanorods on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 500C for 40 under a reducing atmosphere (94% Ar, 6% H2).