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RAMAN DIAGNOSTICS OF CVD DIAMOND GROWTH

Abstrakt

Development of Raman spectroscopic system for diagnostics of growth of diamond and BDD (Boron- Doped-Diamond) thin films during μPA CVD (Microwave Plasma Assisted Chemical Vapour Deposition) process is described. Raman studies of such films were carried out as in-situ monitoring of film deposition as ex-situ measurements conducted for a sample outside the reaction vessel after manufacturing process. Modular system for the in-situ monitoring equipped with fibre-optic probes, was designed and tested. Moreover, Raman and optical microscopy were applied after the process for more detailed study of the deposited films. Solid state lasers having wavelength of 532 nm were applied as the excitation sources. The most significant parameters of the deposited films like their molecular composition, presence of defects and rate of the film growth were evaluated.

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pobrano 51 razy
Wersja publikacji
Accepted albo Published Version
Licencja
Copyright (IMEKO)

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Kategoria:
Aktywność konferencyjna
Typ:
publikacja w wydawnictwie zbiorowym recenzowanym (także w materiałach konferencyjnych)
Tytuł wydania:
Diagnostyka ramanowska wzrostu cienkich warstw diamentowych metodą CVD strony 1 - 4
Język:
angielski
Rok wydania:
2012
Opis bibliograficzny:
Gnyba M.: RAMAN DIAGNOSTICS OF CVD DIAMOND GROWTH// Diagnostyka ramanowska wzrostu cienkich warstw diamentowych metodą CVD/ Busan: International Measurement Confederation, 2012, s.1-4
Bibliografia: test
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  13. M. Bernard, A. Deneuville, and P. Muret, "Non-destructive determination of the boron concentration of heavily doped metallic diamond thin films from Raman spectroscopy", Diamond and Related Materials Vol. 13, Iss. 2, , pp. 282-286, February 2004. otwiera się w nowej karcie
Weryfikacja:
Politechnika Gdańska

wyświetlono 104 razy

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