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Wyniki wyszukiwania dla: chemical vapor deposition
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Distance measurement by the low coherent interferometer
Dane BadawczeThe obtained data was acquired by the interferometric fiber-optic sensor of distance. The setup was constructed of a broadband light source working at the central wavelength of 1560 nm, an optical spectrum analyzer and a fiber-optic 2x1 coupler (with the power split 50:50). All elements were connected by standard single-mode optical fibers. The measurement...
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Distance measurement by the low coherent interferometer with NND layer (the source wavelegth 1310 nm)
Dane BadawczeThe obtained data was acquired by the interferometric fiber-optic sensor of distance. The setup was constructed of a broadband light source working at the central wavelength of 1310 nm, an optical spectrum analyzer, and a fiber-optic 2x1 coupler (with the power split 50:50). All elements were connected by standard single-mode optical fibers. The measurement...
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Anomalous anisotropy of deuterium-grown boron-doped diamond and the role of boron-tetramers in the Mott-Insulator transition
Dane BadawczeWe show anisotropy in the superconductivity for boron-doped diamond thin films prepared with Microwave Plasma Assisted Chemical Vapor Deposition using deuterium-rich plasma. This anomalous phase transition is linked with the emergence of boson quantum entanglement states behaving as a bosonic insulating state. Here, we show that the superconducting...
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Raman data of deuterium and hydrogen grown boron-doped diamond
Dane BadawczeRaman spectra were recorded at room temperature using a micro-Raman spectrometer (Invia, Renishaw) equipped with an edge filter with different excitation wavelengths and lasers: UV λ = 325 nm (HeCd), blue λ = 488 nm (Ar+), green λ = 514 nm (Ar+), and IR λ = 785 nm (IR diode) and 50× microscope objective. To avoid sample heating, the radiation power...
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XPS data of deuterium and hydrogen grown boron-doped diamond
Dane BadawczeThe high-resolution C1s X-ray absorption spectra of BDD@H and BDD@D samples were measured using the facilities of the HE-SGM beamline (HE-SGM) at the BESSY II synchrotron radiation source of Helmholtz–Zentrum Berlin (HZB).[90] The measurements were carried out under ultra-high vacuum conditions: P ≈ 2×10−9 Torr at T = 300 K. The NEXAFS spectra were...
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TEM and EDX study of the Al2O3 ultra thin films
Dane BadawczeThe ultra-thin layers of Al2O3 were deposited on a silicon substrates. The method of atomic layer deposition (Beneq TFS 200 ALD system) was chosen as the proper method of dielectric layer deposition. This method provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water....
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Chemical composition of tellurium oxides thin films deposited by magnetron sputtering method
Dane BadawczeThin films were prepared by radio frequency reactive magnetron sputtering technique. Metallic Te target was sputtered for about 45 min in argon-oxygen atmosphere what resulted in 300 nm film thickness deposition. The pressure in the chamber was below 0.2 Pa and substrate was heated at 200 °C. The distance between sputtered target and the Corning 1737...
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Substrate characterization in a electrochemically derived Manganium-Cobaltium thin films
Dane BadawczeManganium-Cobaltium thin films were electrochemically deposited on a Ni foams subsrates in a one-step process at −1.1 V vs. Ag/AgCl in an aqueous solution of differently concentrated Mn(NO3)2·4H2O and Co(NO3)2·6H2O with the deposition time limited by charges of 60, 120, and 200 mC at 25 °C. The concentration ratios of Mn(NO3)2·4H2O to Co(NO3)2·6H2O...
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Mn-Co nanofilms on nickel foam measured by XPS mehod
Dane BadawczeManganium-Cobaltium based thin films were electrochemically deposited on a Ni based subsrates in a one-step process at −1.1 V vs. Ag/AgCl in an aqueous solution of differently concentrated Mn(NO3)2·4H2O and Co(NO3)2·6H2O with the deposition time limited by charges of 60, 120, and 200 mC at 25 °C. The concentration ratios of Mn(NO3)2·4H2O to Co(NO3)2·6H2O...
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Chemical composition of V2O5 nanorods
Dane BadawczeThe DataSet contains the chemical compositions of the V2O5 nanorods on a silicon substrate. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The As-prepared thin films were annealed at 600C under a synthetic air atmosphere.
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Tables of Physical and Chemical Constants
Dane BadawczeFile contains short tables of physical and chemical constants that might be of use during the physics laboratory classes run in the Institute of Naval Architecture and Ocean Engineering.
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XRD and electrochemical results for MoO3 films deposited using pulsed laser deposition system
Dane BadawczeThe attached data contains XRD and electrochemical results for MoO3 films deposited on fluorine-doped tin oxide glasses. Films were deposited using a pulsed laser deposition system at different conditions. Part of the samples was deposited at room temperature and then annealed at 575°C for given times (samples labeled PLD_RT_575C_xmin, where x stands...
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The chemical and mechanical pressure influence on chromium luminescence
Dane BadawczeIn this study, we aim to compare the changes in the luminescence properties of Ga2O3:Cr3+ modified by Al or Sc ion substitution (chemical pressure) and hydrostatic pressure. We find the same behavior for Ga2–xAlxO3:Cr3+ and different behavior for Ga2–xScxO3:Cr3+ in terms of the optical properties under chemical and mechanical pressure. We consider Al...
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Chemical composition analysis of the LSNO ceramics
Dane BadawczeThe chemical composition of a series of La-Sb-Nb-O ceramics manufactured by the solid-phase reaction method was analyzed. The samples with a various antimony content were measured by XPS method (OmicronNanotechnology UHV system). Analysis confirmed presence of elements: La, Sb, Nb.
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Chemical investigation of the Al2O3 ultra-thin films
Dane BadawczeUltra-thin layers of oluminum oxide (Al2O3) were deposited by ALD method. Atomic layer deposition provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. Samples with a thickness of 2 and 8 nm of alumina...
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Chemical properties of bismuth telluride – carbon composites.
Dane BadawczeCarbon nanotubes and amorphous carbon have been introduced into bismuth telluride matrix (in 0.15 and 0.30 wt % ratio) in order to investigate influence of carbon on composite’s thermoelectric properties. Composites with well-dispersed additives have been obtained by sonication and ball-milling. Chemical composition of materials was confirmed by XPS...
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Polymers doped by Ca or P. Chemical composition investigations
Dane BadawczeThe calcium and phosphorus doped polyurethane polymers (PU) were analyzed by XPS method. A series of samples with various content of Ca and P dopand - from 0% up to 21%) were selected for measutements. The chemical composition and valence state of elements were measurements using OmicronNatechnology UHV system wih Argus hemispherical photoelectron...
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Measurements of the chemical composition of LTO:Cu powders
Dane BadawczeLithium titanate doped by copper was measured by X-ray photoemission spectroscopy (XPS). For sol-gel synthesis lithium acetate dehydrate and titanium (IV) butoxide 97% and copper (II) nitrate from Alfa Aesar were used as a reagents. Cu precursor was added in the proper weight to get an x index equal 0, 0.1 and 0.2. In the first step lithium acetate...
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Chemical investigations of the MoO3 doped by K films deposited FTO
Dane BadawczeMoO3 thin films were synthesized via thermal annealing of thin, metallic Mo films deposited onto the FTO substrate using a magnetron sputtering system. The influence of photointercalation of alkali metal cation (K+) into the MoO3 structure on the photoelectrochemical properties of the molybdenum trioxide films was investigated. The chemical characterisation...
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Depth profile of the chemical composition of the Au-Ag multilayers
Dane BadawczeSilver and gold multilayers were deposited on a silicon substrate by magnetron sputtering method. Both type, Au and Ag thin films had 2 nm of thickness. Totally structure had thickness of 6 nm (Au-Ag-Au). That prepared multilayers were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching...