Filters
total: 20757
filtered: 146
Search results for: FIRESIDE DEPOSIT
-
The AFM micrographs of vanadium oxides thin films obtained at 800°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on a silicon substrate and vanadium thin films were obtained by annealing as-prepared films at...
-
SEM inwestigation of the silver nanostructures
Open Research DataSilver thin films with a thickness of 1nm, 3nm, 5nm, 7nm and 9nm were deposited by a table-top magnetron sputtering unit in a pure argon plasma from a high-purity silver target. Silicon wafers was used as a substrates. As-deposired films were annealed in Ar atmosphere at 550 Celsius degree for 15 minutes.As a result of annealing, Ag nanostructures formed...
-
The AFM micrographs of vanadium oxides thin films obtained at 1200°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
The AFM micrographs of vanadium oxides thin films obtained at 400°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
The AFM micrographs of vanadium oxides thin films obtained at 600°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
The AFM micrographs of of vanadium oxides thin films obtained at 300°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
XRD patterns of VO2 and V6O13 nanostructures
Open Research DataThe DataSet contains the XRD patterns of VO2 and V6O13 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under a reducing atmosphere (94% Ar, 6% H2) at 500, 600 and 700C for 10h.
-
The AFM micrographs of vanadium oxide thin films obtained at 100°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
The AFM micrographs of vanadium oxides thin films obtained at 150°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
XRD patterns of V2O5 thin film morphology dependent on substrate types
Open Research DataThe DataSet contains the XRD patterns of the V2O5 thin film structure dependent on substrate types. The as-prepared thin films were deposited on alumina, zirconium, zirconium oxide and metallic vanadium substrate, then was annealing under an oxidizing atmosphere at 600C for 10h.
-
The AFM micrographs of vanadium oxides thin films obtained at 200°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
The AFM micrographs of vanadium oxides thin films obtained at 450°C
Open Research DataThe DataSet contains the atomic force microscope images of the surface of vanadium oxide thin films. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on quartz glass and silicon substrate and vanadium thin films were obtained by annealing as-prepared...
-
XRD patterns of VO2 and V2O3 thin films obtained at 500°C
Open Research DataThe DataSet contains the XRD patterns of VO2 and V2O3 thin films obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The thin films with different thicknesses (3-9 AsP layers) were deposited on a silicon substrate and were annealing at 500°C under an argon atmosphere.
-
XRD patterns of VO2 and V2O3 thin films obtained at 700°C
Open Research DataThe DataSet contains the XRD patterns of VO2 and V2O3 thin films obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The thin films with different thicknesses (5-9 AsP layers) were deposited on a silicon substrate and were annealing at 700°C under an argon atmosphere.
-
Measurement spectrum obtained with the use of ZnO coated (100 nm) microsphere-based fiber-optic sensor - 200 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 100 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated (100 nm) microsphere-based fiber-optic sensor - 100 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 100 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated (100 nm) microsphere-based fiber-optic sensor - 300 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 100 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
SEM micrographs of VO2 and V6O13 nanostructures
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of VO2 and V6O13 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under a reducing atmosphere (94% Ar, 6% H2) at 600 and 700C for 10h.
-
SEM micrographs of morphology evolution of VO2 and V2O3 thin films obtained at 1000°C
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of VO2 and V2O3 thin films obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The thin films were deposited on a silicon and quartz glass substrate and were annealing at 1000°C under an argon atmosphere.
-
Luminescence of TeO2:Eu thin films
Open Research DataTellurium dioxide doped by europium thin films were deposited by magnetron sputtering method and simultaneously heated at 200 oC. Presence of Eu ions and their valence states was confirmed by X-ray photoemission spectroscopy measurements. The structure of the films as well as the influence of europium dopant on crystalline structure of the films was...
-
Characteristics of selected Anabaena isolates from CCNP Collection
Open Research DataEN: This dataset includes information about Anabaena strains (cyanobacteria) deposited in the Culture Collection of Northern Poland (CCNP), at the Division of Marine Biotechnology, Institute of Oceanography, University of Gdańsk, Poland. Presented data concern Anabaena strains their (1) isolation and culture conditions, (2) taxonomic position, (3) morphology...
-
Depth profile of the gold-silver bimetallic structures
Open Research DataSilver and gold bimetallic layers were deposited on a silicon substrate by magnetron sputtering method. Both, Au and Ag layers had 3 nm of thickness. That prepared nanostructures were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching surface of sample. Each cycle of etching takes 30...
-
SEM micrographs of morphology evolution of VO2 and V2O3 thin films obtained at 700°C
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of VO2 and V2O3 thin films obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The thin films with different thicknesses (3-9 AsP layers) were deposited on a silicon substrate and were annealing at 700°C under an argon...
-
SEM micrographs of morphology evolution of VO2 and V2O3 thin films obtained at 1000°C dependent on film thickness
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of VO2 and V2O3 thin films obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The thin films with different thicknesses (2-3 AsP layers) were deposited on a silicon substrate and were annealing at 1000°C under an argon...
-
SEM micrographs of morphology evolution of VO2 and V2O3 thin films obtained at 500°C
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of VO2 and V2O3 thin films obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The thin films with different thicknesses (3-9 AsP layers) were deposited on a silicon substrate and were annealing at 500°C under an argon...
-
Characteristics of selected Nodularia spumigena isolates from CCNP Collection
Open Research DataEN: This dataset includes information about Nodularia spumigena strains (Cyanobacteria) deposited in the Culture Collection of Northern Poland (CCNP), at the Division of Marine Biotechnology, Institute of Oceanography, University of Gdańsk, Poland. Presented data concern Nodularia spumigena strains, their (1) isolation and culture conditions, (2) taxonomic...
-
SEM micrographs of morphology evolution of V2O5 thin films on quartz glass
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of V2O5 thin films deposited on a quartz glass substrate. The as-prepared thin films were annealing under an oxidizing atmosphere in the temperature range 200-600C. The results show that the morphology of the films dependent on the annealing temperature.
-
SEM micrographs of V2O5 thin film morphology dependent on substrate types
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of V2O5 thin film morphology dependent on substrate types. The as-prepared thin films were deposited on alumina, zirconium, zirconium oxide and metallic vanadium substrate, then was annealing under an oxidizing atmosphere at 600C for 10h. The results show that the morphology of...
-
SEM micrographs of morphology evolution of V2O5 thin films on silicon substrate
Open Research DataThe DataSet contains the scanning electron microscopy (SEM) micrographs of V2O5 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under an oxidizing atmosphere in the temperature range 250-600C. The results show that the morphology of the films dependent on the annealing temperature.
-
Structure and optical measurements of Eu doped tellurium oxide thin films
Open Research DataThin films were deposited by magnetron sputtering method and simultaneously heated at 200 oC. Presence of Eu ions and their valence states was confirmed by X-ray photoemission spectroscopy measurements. The structure of the films as well as the influence of europium dopant on crystalline structure of the films was examined by X-ray diffraction method. ...
-
Depth profile of the chemical composition of the Au-Ag multilayers
Open Research DataSilver and gold multilayers were deposited on a silicon substrate by magnetron sputtering method. Both type, Au and Ag thin films had 2 nm of thickness. Totally structure had thickness of 6 nm (Au-Ag-Au). That prepared multilayers were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching...
-
Plasmon resonance in a TiO2-Au NPs structures
Open Research DataInvestigated structures were deposited on a pre cleaned Corning 1737 glass substrates, which provided flat optical transmission characteristics and high transmission coefficient in a visible light range. Plasmonic nanostructures were formed as a result of thermal annealing. For gold films with thickness of 2.8 nm depiction a table-top dc magnetron sputtering...
-
SEM images of dewetted gold films
Open Research DataGold nanostructures were prepared on silicon - Si(111) as a substrate. as a result of dewetting process. Thin golds films were deposited using a table-top dc magnetron sputtering coater under pure Ar plasma conditions . The Au target had 99.99% purity, the rate of Au layer deposition was about 0.4 nm·s−1 and the incident power was 32 W. The thickness...
-
Oxidation of silver nanostructures
Open Research DataSilver nanostructures were prepared on Si substrate. Thin Ag films (2 and 6 nm thickness) were deposited using a tabletop dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma. The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1 , and the incident power was in the range of 30–40 W. The layer thickness...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 140 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 160 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 180 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 220 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 200 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-0optic sensor - 250 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 210 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 300 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 270 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 190 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 260 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 290 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 170 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 280 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 150 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...
-
Measurement spectrum obtained with the use of ZnO coated microsphere-based fiber-optic sensor - 230 Celsius degrees
Open Research DataApplication of a microsphere-based fiber-optic sensor with 200 nm zinc oxide (ZnO) coating, deposited by Atomic Layer Deposition (ALD) method, for temperature measurements between 100°C and 300°C, is presented. The main advantage of integrating a fiber-optic microsphere with a sensing device is the possibility of monitoring the integrity of the sensor...