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Structural investigations of the Al2O3 ultra thin films
Dane BadawczeUltra-thin layers of Al2O3 were deposited by atomic layer deposition (ALD) (Beneq TFS 200 ALD system). This method provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. Samples with a thickness of 2...
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TEM and EDX study of the Al2O3 ultra thin films
Dane BadawczeThe ultra-thin layers of Al2O3 were deposited on a silicon substrates. The method of atomic layer deposition (Beneq TFS 200 ALD system) was chosen as the proper method of dielectric layer deposition. This method provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water....
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Depth profile of the composition of 8 nm Al2O3 thin film
Dane Badawcze8 nm layer of aluminum oxide (Al2O3) was deposited by ALD method on a s. Atomic layer deposition provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. To investigate the profile of concenration of...
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Chemical investigation of the Al2O3 ultra-thin films
Dane BadawczeUltra-thin layers of oluminum oxide (Al2O3) were deposited by ALD method. Atomic layer deposition provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. Samples with a thickness of 2 and 8 nm of alumina...
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Ellipsometric monitoring during the polarization studies of Mg corrosion in alkaline environment
Dane BadawczeThe dataset contains the ellipsometric results from the Mg polarization studies aiming at understanding the Mg(OH)2 passive layer formation mechanism and conditions. The single-wavelength ellipsometer ELX-02C from Dr Riss GmbH was utilized, operating He-Ne laser at 632.8 nm. The polarization conditions for the experiment are depicted in the related...
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TEM imaging of Ag-Au nanoalloys
Dane BadawczeThe nanostructures of AuAg nanoalloys were prepared by sequential sputtering of metal thin layers (Au/Ag or Ag/Au) followed by annealing under 550 Celsius degree in an argon atmosphere. The basic single layer thickness was usually ca. 3 nm. For investigations two samples wih 50% Au and 50% Ag were selected and samples 1/3 Ag - 2/3 Au and 2/3 Ag - 1/3...
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Chemical analysis of the Au-Ag nanoaloys
Dane BadawczeThe nanostructures of AuAg nanoalloys were prepared by sequential sputtering of gold and silver thin films. Single layer thickness was usually 2.8 nm were deosted by magnetron sputtering method in a Ar plasma. As deposited layers were annealed in Ar atmosphere at 550 degress for 15 minutes. For XPS measurements five samples were selected: pure gold...
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Imaging of the effects of pitting corrosion with the use of AFM
Dane BadawczePitting corrosion is a local attack on a metal surface, limited to a point or small area, which appears as a hole. Pitting corrosion is one of the most harmful forms of corrosion due to the fact that it is associated with small, difficult to detect damage, that can even lead to perforation of the structure. A single pit may range in size from micrometers...
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Distance measurement by the low coherent interferometer with NND layer (the source wavelegth 1310 nm)
Dane BadawczeThe obtained data was acquired by the interferometric fiber-optic sensor of distance. The setup was constructed of a broadband light source working at the central wavelength of 1310 nm, an optical spectrum analyzer, and a fiber-optic 2x1 coupler (with the power split 50:50). All elements were connected by standard single-mode optical fibers. The measurement...